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APPLIED MATERIALS 0010-59787 Ceramic HeaterDescription The AMAT 0010 59787 PECVD reactor is a deposition chamber designed to deposit thin films or layers onto substrates used in various electronic devices and systems. The system employs a Chemical Vapor Deposition (CVD) process to deposit the desired film material onto the surface of the substrate. Specifications Reactor Type: PECVD (Plasma Enhanced Chemical Vapor Deposition) Substrate Loading: Automated single loading chamber Integrated
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APPLIED MATERIALS 0010-59787 Ceramic Heater

APPLIED MATERIALS 0010-59787 Ceramic Heater

Item no : 152932885
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US$ 250.00
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Min. order: 1piece

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Ships within 48 hours · Estimated delivery Aug 6 - Aug 11

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US$ 250.00

1-11

US$ 225.00

12-35

US$ 175.00

36-59

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US$40

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